Furnace Processing Systems
Standard RCH Associates' Furnace Processing Systems include:
-A loading bay comprised of a particle-free load station and non-contact, automatic cantilever loaders.
-A high performance diffusion furnace.
-A source gas cabinet or source and vacuum pump cabinet.
-Processing subsystems for atmospheric or LPCVD processes installed at each tube-level.
-The ASTRA Control System for integrated process programming and operation of all parameters.
Additional systems are available that are configured for manual or automatic push/puller loading.
A furnace system or "bank" includes 4 tube-levels that are stacked within the same footprint. The type and size of a bank is determined by the wafer or substrate size, the processes that are performed and how many wafers are to be processed in a batch.
Processing subsystems are comprised typically of a loader, a process tube or chamber that includes wafer boats and a gas delivery system. For LPCVD, a vacuum system is added. Each subsystem in a bank operates independently.
RCH processing subsystems are designed to accurately perform most any diffusion, oxidation or LPCVD process. Most processes are offered with guaranteed performance.
