Products

Available Processes

• Semiconductor • Photovolatics • MEMS • Nanotechnology
• III/V • LEDS

For information on processing subsystems please click here

Atmospheric Processes

75,100,125,200mm diameter wafers.

  • Dry oxidation
  • Dry oxidation with HCL enhancement
  • Dry oxidation with DCE enhancement
  • Pyrogenic oxidation, internal torch
  • Pyrogenic oxidation, external torch
  • Pyrogenic oxidation with HCL enhancement
  • Pyrogenic oxidation with DCE enhancement
  • DL:H2O bubbler oxidation
  • POCl3 phos dep liquid source doping
  • BBr3 boron dep liquid source doping
  • Solid source doping
  • H2 anneal/alloy
  • Forming gas anneal/alloy/sinter
  • Inert or noble gas anneal/alloy/sinter

LPCVD Processes

50,75,100,125, and 200mm diameter wafers.

  • Intrinsic polysilicon
  • Amorphous silicon
  • Phosphorous doped polysilicon
  • SiPOS (oxygen doped polysilicon)
  • Silicon nitrade (si3N4)
  • Low stress silicon nitride
  • Oxynitride
  • HTO
  • LTO
  • PSG
  • BPSG
  • TEOS
  • Doped TEOS

Most LPCVD processes are available with guaranteed process performace criteria. Please contact Taruius Associates for more information.

Custom and specialized LPCVD processes are reviewed upon request.

Photovoltaics

  • Emitter POCl3 phos dep
  • Thermal oxidation
  • LPCVD silicon nitride
  • Annealing
  • Applicable to 125mm and 156mm square and pseudo-square substrates

Most atmospheric processes are available with guaranteed process performace criteria. Please contact Tarius associates for more information.

Custom and specialized atmospheric processes are reviewed upon request.

About

Tarius Technology Private Limited is a Singapore-based company established in specialising in a wide range of semiconductor products and services. As we continue to expand rapidly in the South East Asian region, we continue to take great pride in the quality of our products and services to ensure our clients' satisfaction.

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