SMALL BATCH SYSTEMS
For Research, Pilotline and Education Applications
Tarius Technology provides small batch furnace processing systems for research, pilot line and educations applications. All Tarius Technology diffusion, oxidation and LPCVD processes for semiconductor, solar and science are available.
To review available processes, please click here.
These research-grade systems include all the features of the Tarius production models packaged in small footprint.
Small Batch Systems Models
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- Processing Systems
- Available Processes
- Processing Subsystems
- Diffusion Furnances
- Small Batch Systems
- Source & Pump Cabinets
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- Bench Top furnace with direct digital temperature control for 50 to 150mm diameter wafers and 125mm to 156mm square substrates. Available with optional stand.
- Bench Top Furnace with direct digital temperature control for 150 to 200mm diameter wafers and 125mm to 156mm square substrates. Available with optional stand.
Example Dimensional Layout 4612-R Research Grade Furnace System
- Stand-alone, partitioned furnace system for 50 to 150mm diameter wafers and 125mm square substrates.
- Available with the ASTRA Control System. Manual or Cantilever loading.
- Single-tube, 2,3 and 4-stack configurations.
- Stand-alone, partitioned furnace system for 50 to 150mm diameter wafers and 125mm to 156mm square substrates. Available with the ASTRA Control System. Manual or Cantilever loading.
- Single-tube to 4-stack configurations.
- Single-tube,2,3 and 4-stack configurations.
To review ASTRA Control System, please click here.
Full Processing Subsystems are available for each model configuration including quartz starter kits and peripherals.
To review Processing Subsystems, please click here.