Standard Tarius Technology' Furnace Processing Systems include:
programming and operation of all parameters.
Additional systems are available that are configured for manual or automatic push/puller loading.
A furnace system or "bank" includes 4 tube-levels that are stacked within the same footprint. The type and size of a bank is determined by the wafer or substrate size, the processes that are performed and how many wafers are to be processed in a batch.
Processing subsystems are comprised typically of a loader, a process tube or chamber that includes wafer boats and a gas delivery system. For LPCVD, a vacuum system is added. Each subsystem in a bank operates independently.
Tarius Technology processing subsystems are designed to accurately perform most any diffusion, oxidation or LPCVD process. Most processes are offered with guaranteed performance.
To review available processes, please click here.
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